Process Type: Deposition
|
Process |
Description |
|
Thermal Oxidation |
|
|
Chrome thin film |
Chrome RF sputter deposition.
dep rate= 9.4nm/min, power=400W RF, pressure=10mT Argon, substrate height =120
|
|
Gold thin film |
Thin films of gold can be deposited via sputtering or evaporation. Ebeam and resistive thermal evaporation are available.
|
Process Type: Etching
|
Process |
Description |
|
Cryogenic etch |
Low temperature silicon etch for high aspect ratio features
|
Process Type: Miscellaneous
|
Process |
Description |
|
Step Height |
Measurement of step height from 50A to 400um
|
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